纳光电集成与先进装备教育部工程研究中心

Vacuum/plasma sources/systems

发布日期: 2016-06-16   作者:  浏览次数: 23

Vacuum-Plasma Technology

Introduction

Plasma system is numbered among the key systems in fabrication of high quality thin film and surface treatment. Nanotech center has succeeded in developing an excellent cost-effective multi-functional plasma deposition, which can realize magnetic sputtering vapour deposition, plasma chemical vapour deposition (PCVD), Filtered Cathodic Vacuum Arc (FCVA), plasma surface treatment and so on. Nanotech center is dedicated to research and development of high-performance plasma system, especially its key technology, primary parts and components, modules and integrated equipment. The plasma systems have been applied for fabrication of optoelectronic devices, display devices, thin film solar cells, light source, storage devices, sensor and so on. 

System

  • Plasma deposition and surface treatment systems

  • PVD and CVD systems (magnetic sputtering, electric arc, laser ablation, PECVD, etc.)

  • Vacuum equipment parts and components (plasma source, super vacuum molecular pump, etc.)

  • Ultrahigh vacuum photoelectric test systems

Features

  • Strong expansibility for module design, integrated units

  • Open structure, adjustment and maintenance simple and convenient

  • Film research platform enables different fabrication process

  • Fabrication of metal, alloy, multi-layer, oxide nitride and carbide thin films

  • High-efficiency cathode, vertical or confocal sputtering

  • High reliability, long term trouble-free operation

Patents & Papers

  • “多功能复合磁控等离子体溅射装置”,授权专利号:ZL200510028705.5